SK hynix will partner with Gauss Labs, an industrial AI startup, to participate in SPIE Advanced Lithography + Patterning 2026 (SPIE AL 2026). At the international conference to be held in San Jose, California, from February 22 to 26, the two companies will share the latest research on AI-based virtual metrology for semiconductor manufacturing processes. […] The post SK hynix and Gauss Labs Present AI-Based Semiconductor Virtual Metrology Research at SPIE AL 2026 first appeared on SK hynix Newsroom .